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Fashion Competition

  • 30 November 2016
  • Author: OCS
  • Number of views: 108
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Fashion Competition
The November 2016 issue of Honolulu Magazine is running the article “Style School,” which assesses and discusses the two local fashion programs, UH Manoa’s FDM and Honolulu CC’s Fashion Design program. It praises FDM’s new computer lab for fitting garments to virtual models and designing retail spaces, gives a shout-out to the annual Fashion Show (pictured), and notes that five recent students have won first-place awards from the International Textile Apparel Association and American Association of Family and Consumer Sciences. Andy Reilly (FDM) is quoted as explaining that the program could definitely use more space, though!
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